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LTK

2.0

Lithography Tool Kit

This kit contain PCells and Macros that will facilitate the design of masks for photolithography and patterns for electron beam lithography.

Author: Long Chang (reinchang@sbcglobal.net)

API version: 0.29

Package link: git+https://github.com/UUhy/LTK.git/tags/v2.0

Documentation: git+https://github.com/UUhy/LTK.git/tags/v2.0/doc/readme.html